Michigan State University
Fundamentals of Ion Sources
Guillaume Machicoane, MSU/FRIB; Daniela Leitner, Lawrence Berkeley National Lab; Daniel Winklehner, MIT; Alain Lapierre, MSU/NSCL
Purpose and Audience
The purpose of this course is to introduce students to the physics and technology of ion sources. The course is suitable for senior undergraduate students, graduate students, and researchers. The course also can provide a broader background to engineers and technicians working in the field of accelerator technology.
Either previous coursework or a general understanding of classical physics and electromagnetism.
It is the responsibility of the student to ensure that they meet the course prerequisites or have equivalent experience.
The goal of the course is to provide a comprehensive introduction and survey of the field. On completion of the course, students are expected to understand the basic workings of ion sources and their associated systems, and to have gained a familiarity with the terminology and concepts of the field such that they can read and understand the ion source literature. Since ion source research is an interdisciplinary field, the course will include an introduction to key technologies used with ion sources including: ultra-high vacuum, high voltage, materials properties and commonly used beam diagnostics for injectors, and low energy beam transport.
A series of morning and afternoon lectures will be given, accompanied by handouts and discussion and an afternoon in the computer laboratory. Discussion of topics of particular interest to students will be encouraged. Problem sets will be assigned as homework, due the next morning. A final exam will be given. A project work will be assigned on the first day of class.
Topics covered will include: Classification of ion sources. Review of plasma and atomic physics as relevant to ion sources; basic plasma parameters (debye length, plasma frequency, collisions, transport); ionization and confinement. Detailed description of various type of positive and negative ion source (EBIS, ECR, laser, vacuum arc, multicusp, RF sources and ion sources for fusion). Industrial and medical applications. Formation of a directed ion beam from the plasma. Extraction systems. Beam transport and modelling of low energy beam transport systems. Space charge and space charge compensation in beam transport lines; Beam diagnostics. Technology of ion source including: Ultra-High Vacuum, High Voltage components, Material properties.
(to be provided by the USPAS) "The Physics and Technology of Ion Sources" (2nd Edition), by I.G. Brown, Wiley and Sons Publishers, 2004. Additional reading suggestion would be the proceedings of the CAS - CERN Accelerator School, Ion Sources-2012.
Students will be evaluated based on performance as follows: final exam (30% of final grade), homework assignments (40% of final grade), and their project work (30%).
Michigan State University course number: PHY 905 - 304 - Fundamentals of Ion Sources
Indiana University course number: Physics 671, Advanced Topics in Accelerator Physics
MIT course number: 8.790, Accelerator Physics